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| [* black] MEMS devices require extremely complicated and sensitive [link|http://en.wikipedia.org/wiki/Microelectromechanical_systems#MEMS_manufacturing_technologies|manufacturing procedures] to produce the kind of accuracy needed for reliable sensors. |
| [* black] Most MEMS devices require a combination of deposition of a film layer, patterning to mask off areas of the deposited film to remain after etching, and etching to remove excess metallic film to achieve the final product. |
| [* black] The image you see in this step is an Invensense ITG3200 3-axis gyroscope. |
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